Electrical transport properties in Ge hyperdoped with Te

dc.contributor.authorCaudevilla, Daniel
dc.contributor.authorPérez-Zenteno, Francisco
dc.contributor.authorDuarte-Cano, Sebastián
dc.contributor.authorGarcía-Hernández, Rodrigo
dc.contributor.authorOlea, Javier
dc.contributor.authorSan Andrés, Enrique
dc.contributor.authorBarrio, Rocío
dc.contributor.authorTorres, Ignacio
dc.contributor.authorGarcía-Emme, Eric
dc.contributor.authorPrado, Álvaro
dc.contributor.authorPastor, David
dc.date.accessioned2024-06-14T11:42:08Z
dc.date.available2024-06-14T11:42:08Z
dc.date.issued2024-06-14
dc.description.abstractIn this work we have successfully hyperdoped germanium with tellurium with a concentration peak of 1021 cm−3. The resulting hyperdoped layers show good crystallinity and sub-bandgap absorption at room temperature which makes the material a good candidate for a new era of complementary metal-oxide-semiconductor-compatible short-wavelength-infrared photodetectors. We obtained absorption coefficients α higher than 4.1×103 cm−1 at least up to 3 μm. In this study we report the temperature-dependency electrical properties of the hyperdoped layer measured in van der Pauw configuration. The electrical behaviour of this hyperdoped material can be explained with an electrical bilayer coupling/decoupling model and the values for the isolated hyperdoped layer are a resistivity of 4.25×10−3Ω·cm with an electron-mobility around −100 cm2 V−1 s−1.es_ES
dc.identifier.doihttp://dx.doi.org/10.1088/1361-6641/ac9a67
dc.identifier.urihttps://hdl.handle.net/20.500.14855/3049
dc.language.isoenges_ES
dc.rights.accessRightsembargoed accesses_ES
dc.subjecthyperdoping, tellurium, cryogenic ion implantation, bilayer modeles_ES
dc.titleElectrical transport properties in Ge hyperdoped with Tees_ES
dc.typejournal articlees_ES

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