Electrical transport properties in Ge hyperdoped with Te
| dc.contributor.author | Caudevilla, Daniel | |
| dc.contributor.author | Pérez-Zenteno, Francisco | |
| dc.contributor.author | Duarte-Cano, Sebastián | |
| dc.contributor.author | García-Hernández, Rodrigo | |
| dc.contributor.author | Olea, Javier | |
| dc.contributor.author | San Andrés, Enrique | |
| dc.contributor.author | Barrio, Rocío | |
| dc.contributor.author | Torres, Ignacio | |
| dc.contributor.author | García-Emme, Eric | |
| dc.contributor.author | Prado, Álvaro | |
| dc.contributor.author | Pastor, David | |
| dc.date.accessioned | 2024-06-14T11:42:08Z | |
| dc.date.available | 2024-06-14T11:42:08Z | |
| dc.date.issued | 2024-06-14 | |
| dc.description.abstract | In this work we have successfully hyperdoped germanium with tellurium with a concentration peak of 1021 cm−3. The resulting hyperdoped layers show good crystallinity and sub-bandgap absorption at room temperature which makes the material a good candidate for a new era of complementary metal-oxide-semiconductor-compatible short-wavelength-infrared photodetectors. We obtained absorption coefficients α higher than 4.1×103 cm−1 at least up to 3 μm. In this study we report the temperature-dependency electrical properties of the hyperdoped layer measured in van der Pauw configuration. The electrical behaviour of this hyperdoped material can be explained with an electrical bilayer coupling/decoupling model and the values for the isolated hyperdoped layer are a resistivity of 4.25×10−3Ω·cm with an electron-mobility around −100 cm2 V−1 s−1. | es_ES |
| dc.identifier.doi | http://dx.doi.org/10.1088/1361-6641/ac9a67 | |
| dc.identifier.uri | https://hdl.handle.net/20.500.14855/3049 | |
| dc.language.iso | eng | es_ES |
| dc.rights.accessRights | embargoed access | es_ES |
| dc.subject | hyperdoping, tellurium, cryogenic ion implantation, bilayer model | es_ES |
| dc.title | Electrical transport properties in Ge hyperdoped with Te | es_ES |
| dc.type | journal article | es_ES |
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